Samsung and VeriSilicon Enable Blaize to Meet Time-to-Market Goals for New AI Edge Processor

November 3, 2020 Tiera Oliver

Samsung Electronics, in collaboration with design services provider, VeriSilicon, has supported the on-time market launch of AI Edge computing startup Blaize’s hardware platform.

Leveraging Samsung Foundry’s 14nm FinFET process technology and VeriSilicon’s chip design and IP, Blaize is now offering its AI Edge computing Pathfinder and Xplorer platforms equipped with the Blaize Graph Streaming Processor (GSP).

Blaize is addressing a fundamental issue in Edge AI application deployment, per the company, existing solutions are either unable to handle the required computational load, or too costly and difficult to implement in products. Per the company, Blaize’s solution offers a 100% programmable hardware platform with a combination of low-latency AI processing, low energy demand, multi-sensor AI analytics, and an accompanying suite of software tools that are designed to simplify and accelerate the AI development process.   

At the outset of Blaize’s engagement, Samsung Foundry assessed initial plans and goals for the GSP and recommended involving VeriSilicon, a one-stop source for custom silicon solutions and semiconductor IP, with a track record including other AI-related projects.

An early order of business was selecting the optimal manufacturing process node; after evaluation of many options, Samsung Foundry’s 14nm FinFET process emerged as the ideal choice for this product.

For more information, visit: https://www.samsung.com/us/

About the Author

Tiera Oliver, edtorial intern for Embedded Computing Design, is responsible for web content edits as well as newsletter updates. She also assists in news content as far as constructing and editing stories. Before interning for ECD, Tiera had recently graduated from Northern Arizona University where she received her B.A. in journalism and political science and worked as a news reporter for the university's student led newspaper, The Lumberjack.

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