SEOUL, KR and SAN JOSE, CA. MagnaChip Semiconductor Corporation now offers foundry customers its second generation 0.13 micron 18V high voltage process technology. This technology offers fewer steps, allows suitable high voltage device design rules to shrink chip size and adds a new device for DAC block design compared to the first-generation process.
This second-generation process has improved 1.8V device current performance for high speed. Furthermore, it added LHL, Vgs=18V, Vds=1.8V, device suitable for DAC block designs to the prior device list. It enables highly integrated designs by applying the same design rules for both top and internal metals. MagnaChip has also advanced high voltage device design rules to achieve approximately a 7 percent reduction in chip size. The second-generation process eliminated two process steps to achieve a competitive number of process steps in the industry.
“The second generation 0.13 micron 18V high voltage process technology is dedicated for high performance source driver IC for LCD and OLED TVs,” said YJ Kim, CEO of MagnaChip. “We will continue to improve the performance of our high voltage technology to lead the high voltage sector and help our customers stay competitive in the market.”
For more information, please visit http://www.magnachip.com/.