European Research Institute Chooses Veeco MOCVD Platform for Wireless AND Broadband Communication Applications

August 13, 2020 Tiera Oliver

Veeco Instruments Inc announced that IHP Microelectronics, based in Frankfurt, Germany, has selected Veeco’s TurboDisc metal organic chemical vapor deposition (MOCVD) system for the development of silicon-based microelectronic technologies.

IHP is a research and development institute focused on silicon-based systems, highest-frequency integrated circuits, and technologies for wireless and broadband communication.

According to the company, Veeco’s TurboDisc platform has been the foundation of Veeco’s compound semiconductor materials science leadership. The proprietary technology is a key enabler for demanding As/P and GaN applications for next-generation communications infrastructure and efficient microelectronic devices.

Also, per the company, the TurboDisc platform provides production ramping due to recipe capabilities up to 50% quicker than when using traditional batch tools. In addition, the platform also includes Veeco’s IsoFlange and SymmHeat technologies, which provide homogeneous laminar flow and uniform temperature profile across the entire wafer.

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About the Author

Tiera Oliver, edtorial intern for Embedded Computing Design, is responsible for web content edits as well as newsletter updates. She also assists in news content as far as constructing and editing stories. Before interning for ECD, Tiera had recently graduated from Northern Arizona University where she received her B.A. in journalism and political science and worked as a news reporter for the university's student led newspaper, The Lumberjack.

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