Veeco Instruments Inc announced that IHP Microelectronics, based in Frankfurt, Germany, has selected Veeco’s TurboDisc metal organic chemical vapor deposition (MOCVD) system for the development of silicon-based microelectronic technologies.
IHP is a research and development institute focused on silicon-based systems, highest-frequency integrated circuits, and technologies for wireless and broadband communication.
According to the company, Veeco’s TurboDisc platform has been the foundation of Veeco’s compound semiconductor materials science leadership. The proprietary technology is a key enabler for demanding As/P and GaN applications for next-generation communications infrastructure and efficient microelectronic devices.
Also, per the company, the TurboDisc platform provides production ramping due to recipe capabilities up to 50% quicker than when using traditional batch tools. In addition, the platform also includes Veeco’s IsoFlange and SymmHeat technologies, which provide homogeneous laminar flow and uniform temperature profile across the entire wafer.
For more information, visit www.veeco.com or https://www.ihp-microelectronics.com/en/start.html
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