PathPartner to showcase its automotive vision expertise and technology services at embedded world 2018

February 25, 2018 ECD Staff

PathPartner Technology, a product R&D and engineering specialist, today announced that it will demonstrate its latest automotive vision expertise and technology services at embedded world 2018 (Booth 3A-437) in Nuremberg, Germany from Feb 27th – Mar 1st, 2018.

 

PathPartner’s demonstrations at Embedded World 2018 will include:

An in-cockpit camera based advanced driver monitoring solution

 

Radar technology based forward object detection

Deep learning based traffic sign recognition, and pedestrian and vehicle detection

 

Fast boot solutions on a range of hardware platforms

“We are extremely excited to be showcasing some of our latest innovations in automotive solutions and services,” said Dipanjan Ghosh, CTO and Head of Automotive at PathPartner. “Our demonstrations combine over a decade of experience in imaging, computer vision and embedded systems, coupled with an unparalleled experience in developing technology solutions for automotive clients across infotainment, ADAS and digital cockpit domains”

One of the key highlights of PathPartner’s demonstrations will be a single camera based Driver Monitoring Solution (DMS), which will be available for commercial evaluation in second half of this year.

“As vehicles become more and more connected and autonomous, auto makers are seeking reliable solutions for enhanced safety,” said Vinay M K, VP R&D for DMS. “While there are several solutions available for driver drowsiness and inattention monitoring, PathPartner’s DMS provides a reliable, low cost, automotive grade, single camera based solution that can be easily customized for our client needs.”

To experience these innovations, visit PathPartner at Booth 3A-437 in embedded world 2018, Nuremberg, Germany from 27th Feb – 1st Mar, 2018

For more information, please visit www.pathpartnertech.com

Previous Article
N10nm pattern generation using thermal scanning probe lithography enabled by simplified materials and processes
N10nm pattern generation using thermal scanning probe lithography enabled by simplified materials and processes

Thermal scanning probe lithography (tSPL) has been used to create patterns with sub-20 nm half pitch resolu...

Next Article
IAR Systems Enables High-performance Machine Learning Based on Neural Nets From Arm

IAR Systems(r), the future-proof supplier of software tools and services for embedded development, has adde...